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Author(s):
VEPREK, S; KUNSTMANN, T; VOLM, D; al., et 
Title:
Relaxation of interfacial stress and improved quality of heteroepitaxial 3C-SiC films on (100)Si deposited by organometallic chemical vapor deposition at 1200 degrees C 
Journal title:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 
Year:
1997 
Journal volume:
15 
Journal issue:
Pages contribution:
10-17