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Originaltitel:
Innovative Nanofabrication Methods and Thin-Film Organic Devices 
Übersetzter Titel:
nnovative Nanofabrication Methods and Thin-Film Organic Devices 
Jahr:
2008 
Dokumenttyp:
Habilitation 
Institution:
Fakultät für Elektrotechnik und Informationstechnik 
Betreuer:
Prof. Aldo Di Carlo, Università Tor Vergata, Rom 
Gutachter:
Prof. Dr. Wolfgang Mathis, Universität Hannover 
Sprache:
en 
Fachgebiet:
ELT Elektrotechnik 
Stichworte:
nanoelectronics, molecular electronics, nanoimprint lithography (NIL), optoelectronic 
Kurzfassung:
Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our...    »
 
Übersetzte Kurzfassung:
Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our...    »
 
Mündliche Prüfung:
14.11.2008 
Letzte Änderung:
13.11.2009