Nanoscale patterning at the Si/SiO2/graphene interface by focused He+ beam

Document type:: Zeitschriftenaufsatz
Author(s):: Böttcher, Artur; Schwaiger, Ruth; Pazdera, Tobias M; Exner, Daniela; Hauns, Jakob; Strelnikov, Dmitry; Lebedkin, Sergei; Gröger, Roland; Esch, Friedrich; Lechner, Barbara A J; Kappes, Manfred M
Title:: Nanoscale patterning at the Si/SiO2/graphene interface by focused He+ beam
Journal title:: Nanotechnology
Year:: 2020
Journal volume:: 31
Journal issue:: 50
Pages contribution:: 505302
Fulltext / DOI:: doi:10.1088/1361-6528/abb5cf
Publisher:: IOP Publishing
E-ISSN:: 0957-44841361-6528
Date of publication:: 06.10.2020
BibTeX