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Dokumenttyp:
Konferenzbeitrag 
Autor(en):
Imtaar, M.Y.; Li, P.; Varga, E.; Csaba, G.; Bernstein, G.H.; Scarpa, G.; Porod, W.; Lugli, P. 
Titel:
Nanomagnetic logic devices fabrication using nanoimprint lithography 
Abstract:
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method. 
Kongress- / Buchtitel:
13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) > 578 - 581 
Kongress / Zusatzinformationen:
Beijing China, 05-08 Aug 2013 
Verlag / Institution:
IEEE 
Jahr:
2013 
Quartal:
3. Quartal 
Jahr / Monat:
2013-08 
Monat:
Aug 
Seiten:
578-581 
Print-ISBN:
978-1-4799-0675-8 
Serien-ISSN:
1944-9399 
Sprache:
en