Nanomagnetic logic devices fabrication using nanoimprint lithography
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method.
Kongress- / Buchtitel:
13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) > 578 - 581