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Document type:
Konferenzbeitrag
Author(s):
Imtaar, M.A.; Scarpa, G.; Lugli, P.
Title:
Nanomagnetic Logic Devices Fabrication using Nanoimprint Lithography
Abstract:
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method.
Book / Congress title:
13th IEEE International Conference on Nanotechnology, Beijing, China, Aug 5-8, 2013
Congress (additional information):
Beijing, China, Aug 05 - 08, 2013
Publisher:
IEEE Xplore Digital Library
Year:
2013
Quarter:
3. Quartal
Year / month:
2013-08
Month:
Aug
Pages:
578 - 581
Language:
en
Fulltext / DOI:
doi:10.1109/NANO.2013.6720988
WWW:
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6720988
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