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Document type:
Zeitschriftenaufsatz 
Author(s):
Bareiß, M.; Kälblein, D.; Jirauschek, C.; Exner, A.; Pavlichenko, I.; Lotsch, B.; Zschieschang, U.; Klauk, H.; Scarpa, G.; Fabel, B.; Porod, W.; Lugli, P. 
Title:
Ultra-thin titanium oxide 
Abstract:
We demonstrate the fabrication of ultra-thin titanium oxide films by plasma-induced surface oxidation. Ellipsometry measurements indicate an oxide thickness of about 2 nm. Electrical characterization was performed on microscale and nanoscale metal-insulator-metal tunneling diodes. Electrical fields up to 22 MV/cm were applied without destroying the titanium oxide films. The current-voltage-characteristic of the diodes are found to be asymmetric with respect to zero bias when employing electrodes...    »
 
Keywords:
Gold Electrodes Titanium Metallic thin films Permittivity 
Journal title:
Appl. Phys. Lett. 101, 083113 (2012) 
Year:
2012 
Language:
en 
Publisher:
AIP Publishing LLC.