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- Document type:
- Konferenzbeitrag
- Author(s):
- Lugli, P.; Harrer, S.; Strobel, S.; Brunetti, F.; Scarpa, G.; Tornow, M.; Abstreiter, G.
- Title:
- Advances in nanoimprint lithography
- Abstract:
- Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown. (18 References).
- Book / Congress title:
- Proceedings of the 7th IEEE International Conference on Nanotechnology. IEEE.
- Congress (additional information):
- HongKong, Aug 02 - 05, 2007
- Publisher:
- IEEE Xplore Digital Library
- Year:
- 2008
- Quarter:
- 3. Quartal
- Year / month:
- 2008-08
- Month:
- Aug
- Pages:
- 1179-1184
- Language:
- en
- Fulltext / DOI:
- doi:10.1109/NANO.2007.4601394
- WWW:
- http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=4601394
- Format:
- Text
BibTeX