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Document type:
Zeitschriftenaufsatz 
Author(s):
Max Stelzer ; Moritz Jung ; Ursula Wurstbauer ; Alexander Holleitner ; Franz Kreupl 
Title:
Highly Reliable Contacts to Silicon Enabled by Low Temperature Sputtered Graphenic Carbon 
Abstract:
Titanium silicide (TiSi) contacts are frequently used metal-silicon contacts but are known to diffuse into the active region under high current density stress pulses. Recently, we demonstrated that graphenic carbon (GC) deposited by CVD at 1000∘C on silicon has the same low Schottky barrier as TiSi, but a much improved reliability against high current density stress pulses. In this paper we demonstrate now that the deposition of graphenic carbon is possible at 100∘C -400∘C by a sputter process....    »
 
Journal title:
IEEE Journal of the Electron Devices Society 
Year:
2019 
Covered by:
Scopus 
Reviewed:
ja 
Language:
en 
TUM Institution:
Hybride Elektronische Systeme