The first part of this thesis addressed the phosphorus doping of silicon nanocrystals (Si-NCs). It is found that both the atomic P incorporation efficiency near to 100% and its segregation to the surface during growth by a gas-phase method are independent of the Si-NC size. Electron spin resonance data show that the concentration of donor electrons falls below the atomic P concentration by at least one order of magnitude, which for large Si-NCs is due to P compensation by Si dangling bonds. Moreover, it is shown that a size-dependent localization of the P wave function sets in already for Si-NCs with diameters of approx. 20nm. In the second part of the work, we have clarified a number of open questions concerning the line shape, the magnitude of the residual broadening, and the substructure of paramagnetic resonance lines of boron in bulk Si by a quantitative study of the effects due to Si isotopes on the acceptor wave function.
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The first part of this thesis addressed the phosphorus doping of silicon nanocrystals (Si-NCs). It is found that both the atomic P incorporation efficiency near to 100% and its segregation to the surface during growth by a gas-phase method are independent of the Si-NC size. Electron spin resonance data show that the concentration of donor electrons falls below the atomic P concentration by at least one order of magnitude, which for large Si-NCs is due to P compensation by Si dangling bonds. More...
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