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Document type:
Zeitschriftenaufsatz 
Author(s):
Figueroa, A. I.; Zhang, S. L.; Baker, A. A.; Chalasani, R.; Kohn, A.; Speller, S. C.; Gianolio, D.; Pfleiderer, C.; {van der Laan}, G.; Hesjedal, T. 
Title:
Strain in Epitaxial {{MnSi}} Films on {{Si}}(111) in the Thick Film Limit Studied by Polarization-Dependent Extended x-Ray Absorption Fine Structure 
Abstract:
We report a study of the strain state of epitaxial MnSi films on Si(111) substrates in the thick film limit (100\textendash{}500 \AA{}) as a function of film thickness using polarization-dependent extended x-ray absorption fine structure (EXAFS). All films investigated are phase-pure and of high quality with a sharp interface between MnSi and Si. The investigated MnSi films are in a thickness regime where the magnetic transition temperature Tc assumes a thickness-independent enhanced value of $\...    »
 
Journal title:
Physical Review B 
Year:
2016 
Journal volume:
94 
Month:
nov 
Journal issue:
17 
Pages contribution:
174107