Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition

Papageorgiou, Anthoula C.; Fischer, Sybille; Oh, Seung Cheol; Sağlam, Özge; Reichert, Joachim; Wiengarten, Alissa; Seufert, Knud; Vijayaraghavan, Saranyan; Écija, David; Auwärter, Willi; Allegretti, Francesco; Acres, Robert G.; Prince, Kevin C.; Diller, Katharina; Klappenberger, Florian; Barth, Johannes V.

doi:10.1021/nn401171z

Author(s):: Papageorgiou, Anthoula C.; Fischer, Sybille; Oh, Seung Cheol; Sağlam, Özge; Reichert, Joachim; Wiengarten, Alissa; Seufert, Knud; Vijayaraghavan, Saranyan; Écija, David; Auwärter, Willi; Allegretti, Francesco; Acres, Robert G.; Prince, Kevin C.; Diller, Katharina; Klappenberger, Florian; Barth, Johannes V.
Title:: Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition
Journal title:: ACS Nano
Year:: 2013
Pages contribution:: 4520-4526
Fulltext / DOI:: doi:10.1021/nn401171z
Publisher:: American Chemical Society (ACS)
Date of publication:: 28.05.2013
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