Photoinduced C–C Reactions on Insulators toward Photolithography of Graphene Nanoarchitectures

Palma, Carlos-Andres; Diller, Katharina; Berger, Reinhard; Welle, Alexander; Björk, Jonas; Cabellos, Jose Luis; Mowbray, Duncan J.; Papageorgiou, Anthoula C.; Ivleva, Natalia P.; Matich, Sonja; Margapoti, Emanuela; Niessner, Reinhard; Menges, Bernhard; Reichert, Joachim; Feng, Xinliang; Räder, Hans Joachim; Klappenberger, Florian; Rubio, Angel; Müllen, Klaus; Barth, Johannes V.

doi:10.1021/ja412868w

Author(s):: Palma, Carlos-Andres; Diller, Katharina; Berger, Reinhard; Welle, Alexander; Björk, Jonas; Cabellos, Jose Luis; Mowbray, Duncan J.; Papageorgiou, Anthoula C.; Ivleva, Natalia P.; Matich, Sonja; Margapoti, Emanuela; Niessner, Reinhard; Menges, Bernhard; Reichert, Joachim; Feng, Xinliang; Räder, Hans Joachim; Klappenberger, Florian; Rubio, Angel; Müllen, Klaus; Barth, Johannes V.
Title:: Photoinduced C–C Reactions on Insulators toward Photolithography of Graphene Nanoarchitectures
Journal title:: J. Am. Chem. Soc.
Year:: 2014
Journal volume:: 136
Journal issue:: 12
Pages contribution:: 4651-4658
Fulltext / DOI:: doi:10.1021/ja412868w
Publisher:: American Chemical Society (ACS)
Date of publication:: 26.03.2014
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