Distance-Based Multivariate Anomaly Detection in Wire Arc Additive Manufacturing

Dokumenttyp:: Konferenzbeitrag
Autor(en):: Reisch, Raven; Hauser, Tobias; Lutz, Benjamin; Pantano, Matteo; Kamps, Tobias; Knoll, Alois
Titel:: Distance-Based Multivariate Anomaly Detection in Wire Arc Additive Manufacturing
Seitenangaben Beitrag:: 659-664
Stichworte:: Anomaly Detection, Time Series, Multivariate, Additive Manufacturing, Machine Learning
Kongress- / Buchtitel:: 2020 19th IEEE International Conference on Machine Learning and Applications (ICMLA)
Verlag / Institution:: IEEE
Publikationsdatum:: 01.12.2020
Jahr:: 2020
Print-ISBN:: 9781728184708
Volltext / DOI:: doi:10.1109/icmla51294.2020.00109
BibTeX