We present a method for the in-situ determination of Young's modulus of a nanomechanical string resonator subjected to tensile stress. It relies on measuring a large number of harmonic eigenmodes and allows to access Young's modulus even for the case of a stress-dominated frequency response. We use the proposed framework to obtain the Young's modulus of four different wafer materials, comprising the three different material platforms amorphous silicon nitride, crystalline silicon carbide and crystalline indium gallium phosphide. The resulting values are compared with theoretical and literature values where available, revealing the need to measure Young's modulus on the sample material under investigation for precise device characterization.      «

We present a method for the in-situ determination of Young's modulus of a nanomechanical string resonator subjected to tensile stress. It relies on measuring a large number of harmonic eigenmodes and allows to access Young's modulus even for the case of a stress-dominated frequency response. We use the proposed framework to obtain the Young's modulus of four different wafer materials, comprising the three different material platforms amorphous silicon nitride, crystalline silicon carbide and cry...     »