Benutzer: Gast  Login
Dokumenttyp:
Konferenzbeitrag 
Art des Konferenzbeitrags:
Poster 
Autor(en):
Alfonso Furio, Max Stelzer, Moritz Jung, Franz Kreupl 
Titel:
Graphenic Carbon as etching mask: patterning with photolithography and KOH etching 
Abstract:
The wet anistropic etching process is widely used in the field of micromachining (MEMS), particularly for commercial products as accelometers or sensors. Hard masks like oxide or nitride play a key role for the transfer of patterns to the substrate after the lithography process. This work reports on the use of polycrystalline graphenic carbon (GC), which forms covalent bonds to silicon, as an etch mask for wet chemical processing. It is shown a simple method to pattern structures on (1 0 0) sili...    »
 
Kongress- / Buchtitel:
9th Young Researcher Meeting, Salerno 2018 
Verlagsort:
Salerno, Italy 
Jahr:
2018 
Jahr / Monat:
2018-07 
Sprache:
en 
TUM Einrichtung:
Hybride Elektronische Systeme