Benutzer: Gast  Login
Dokumenttyp:
Konferenzbeitrag 
Autor(en):
Lugli, P.; Harrer, S.; Strobel, S.; Brunetti, F.; Scarpa, G.; Tornow, M.; Abstreiter, G. 
Titel:
Advances in nanoimprint lithography 
Abstract:
Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown. (18 References). 
Kongress- / Buchtitel:
Proceedings of the 7th IEEE International Conference on Nanotechnology. IEEE. 
Kongress / Zusatzinformationen:
HongKong, Aug 02 - 05, 2007 
Verlag / Institution:
IEEE Xplore Digital Library 
Jahr:
2008 
Quartal:
3. Quartal 
Jahr / Monat:
2008-08 
Monat:
Aug 
Seiten:
1179-1184 
Sprache:
en 
Format:
Text