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Document type:
Konferenzbeitrag 
Author(s):
Lugli, P.; Harrer, S.; Strobel, S.; Brunetti, F.; Scarpa, G.; Tornow, M.; Abstreiter, G. 
Title:
Advances in nanoimprint lithography 
Abstract:
Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown. (18 References). 
Book / Congress title:
Proceedings of the 7th IEEE International Conference on Nanotechnology. IEEE. 
Congress (additional information):
HongKong, Aug 02 - 05, 2007 
Publisher:
IEEE Xplore Digital Library 
Year:
2008 
Quarter:
3. Quartal 
Year / month:
2008-08 
Month:
Aug 
Pages:
1179-1184 
Language:
en 
Format:
Text