Lugli, P.; Harrer, S.; Strobel, S.; Brunetti, F.; Scarpa, G.; Tornow, M.; Abstreiter, G.
Advances in nanoimprint lithography
Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown. (18 References).
Kongress- / Buchtitel:
Proceedings of the 7th IEEE International Conference on Nanotechnology. IEEE.