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Document type:
Konferenzbeitrag 
Author(s):
Reisch, Raven; Hauser, Tobias; Lutz, Benjamin; Pantano, Matteo; Kamps, Tobias; Knoll, Alois 
Title:
Distance-Based Multivariate Anomaly Detection in Wire Arc Additive Manufacturing 
Pages contribution:
659-664 
Keywords:
Anomaly Detection, Time Series, Multivariate, Additive Manufacturing, Machine Learning 
Book / Congress title:
2020 19th IEEE International Conference on Machine Learning and Applications (ICMLA) 
Publisher:
IEEE 
Date of publication:
01.12.2020 
Year:
2020 
Print-ISBN:
9781728184708