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Document type:
Konferenzbeitrag 
Author(s):
Imtaar, M.Y.; Li, P.; Varga, E.; Csaba, G.; Bernstein, G.H.; Scarpa, G.; Porod, W.; Lugli, P. 
Title:
Nanomagnetic logic devices fabrication using nanoimprint lithography 
Abstract:
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method. 
Book / Congress title:
13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) > 578 - 581 
Congress (additional information):
Beijing China, 05-08 Aug 2013 
Publisher:
IEEE 
Year:
2013 
Quarter:
3. Quartal 
Year / month:
2013-08 
Month:
Aug 
Pages:
578-581 
Print-ISBN:
978-1-4799-0675-8 
Bookseries ISSN:
1944-9399 
Language:
en