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Document type:
Zeitschriftenaufsatz 
Author(s):
Scarpa, G.; Abdellah, A.; Exner, A.; Harrer, S.; Penso Blanco, G.; Wiedemann, W.; Schmidt-Mende, L.; Lugli, P. 
Title:
Patterning poly(3-hexylthiophene) (P3HT) in the sub-50-nm Region by Nanoimprint Lithography 
Abstract:
We use thermal and room temperature nanoimprint lithography (NIL) for directly patterning the photoactive polymer poly(3-hexylthiophene-2,5-diyl) (P3HT) in the sub-50-nm region. Different types of molds were used to directly imprint the desired structures into P3HT thin films. Good pattern transfer is achieved independent of the presence of other underlying polymer layers or the type of substrate incorporated. Further, we discuss the future application of this technology to the fabrication of or...    »
 
Journal title:
Nanotechnology, IEEE Transactions on (Volume:10 , Issue: 3 ) 
Year:
2010 
Year / month:
2010-04 
Quarter:
2. Quartal 
Month:
Apr 
Pages contribution:
482 - 488 
Reviewed:
ja 
Language:
en 
Format:
Text