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Document type:
Konferenzbeitrag 
Contribution type:
Vortrag / Präsentation 
Author(s):
M. Stelzer, M. Jung, U. Wurstbauer, A.W. Holleitner, F. Kreupl 
Title:
Low Temperature Sputtered Graphenic Carbon Enables Highly Reliable Contacts to Silicon 
Abstract:
Titanium silicide (TiSi) contacts are commonly used metal- silicon contacts but are known to diffuse into the active region under high current stress. Recently we demonstrated that graphenic carbon (GC) deposited by CVD has the same low Schottky barrier on silicon as TiSi, but a much improved reliability against high current stress. The drawback of the CVD-GC is the required deposition temperature of ~ 900 °C. In this paper we demonstrate n ow that the deposition of graphenic carbo...    »
 
Book / Congress title:
IEDM 2018 
Congress (additional information):
IEEE International Electron Devices Meeting (IEDM) 
Organization:
IEEE 
Year:
2018 
TUM Institution:
Hybride Elektronische Systeme