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Document type:
Konferenzbeitrag 
Contribution type:
Poster 
Author(s):
Alfonso Furio, Max Stelzer, Moritz Jung, Franz Kreupl 
Title:
Graphenic Carbon as etching mask: patterning with photolithography and KOH etching 
Abstract:
The wet anistropic etching process is widely used in the field of micromachining (MEMS), particularly for commercial products as accelometers or sensors. Hard masks like oxide or nitride play a key role for the transfer of patterns to the substrate after the lithography process. This work reports on the use of polycrystalline graphenic carbon (GC), which forms covalent bonds to silicon, as an etch mask for wet chemical processing. It is shown a simple method to pattern structures on (1 0 0) sili...    »
 
Book / Congress title:
9th Young Researcher Meeting, Salerno 2018 
Publisher address:
Salerno, Italy 
Year:
2018 
Year / month:
2018-07 
Language:
en 
TUM Institution:
Hybride Elektronische Systeme