Login
- Dokumenttyp:
- Konferenzbeitrag
- Autor(en):
- Imtaar, M.Y.; Li, P.; Varga, E.; Csaba, G.; Bernstein, G.H.; Scarpa, G.; Porod, W.; Lugli, P.
- Titel:
- Nanomagnetic logic devices fabrication using nanoimprint lithography
- Abstract:
- We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method.
- Kongress- / Buchtitel:
- 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) > 578 - 581
- Kongress / Zusatzinformationen:
- Beijing China, 05-08 Aug 2013
- Verlag / Institution:
- IEEE
- Jahr:
- 2013
- Quartal:
- 3. Quartal
- Jahr / Monat:
- 2013-08
- Monat:
- Aug
- Seiten:
- 578-581
- Print-ISBN:
- 978-1-4799-0675-8
- Serien-ISSN:
- 1944-9399
- Sprache:
- en
- Volltext / DOI:
- doi:10.1109/NANO.2013.6720988
- WWW:
- http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6720988
BibTeX