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Document type:
Konferenzbeitrag 
Contribution type:
Vortrag / Präsentation 
Author(s):
S. Meier, H. Rinck, B. Lange, E. Muellner, R. Brederlow, M. Enzelberger-Heim, S. Summerfelt, F. Kreupl, B. Wolf 
Title:
Patterning Platinum by Selective Wet Etching of Sacrificial Pt-Al Alloy 
Abstract:
Regardless of its functionality, there is no IC-compatible process to pattern platinum. This can be attributed to the inertness of the noble metal. Pt survives extreme condi-tions, and is used in electrochemical, temperature, and gas sensors. In this paper, we introduce a process enabling Pt structures of 1μm thickness and submicron feature size on 200mm wafers. It is the industry’s first with focus on high process control while eliminating contamination i...    »
 
Editor:
IEEE 
Book / Congress title:
Electron Devices Technology and Manufacturing Conference (EDTM) 
Organization:
IEEE 
Date of publication:
16.06.2020 
Year:
2020 
Covered by:
Scopus 
Reviewed:
ja 
Language:
en 
TUM Institution:
Hybride Elektronische Systeme