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Document type:
Zeitschriftenaufsatz 
Author(s):
Max Stelzer, Moritz Jung, Franz Kreupl 
Title:
Graphenic Carbon: A Novel Material to Improve the Reliability of Metal-Silicon Contacts 
Abstract:
Contact resistance and thermal degradation of metal-silicon contacts are major challenges in nanoscale CMOS as well as in power device applications. Titanium silicide (TiSi) is commonly used to establish low-barrier height contacts to silicon, in state-of-the-art FinFETs or Schottky diodes. But the metal is known to diffuse into the active region under high current stress, as during an electro-static discharge (ESD) event. This work shows with a Schottky diode as test vehicle that a carbon-silic...    »
 
Journal title:
IEEE Journal of the Electron Devices Society 
Year:
2017 
Year / month:
2017-07 
Covered by:
Scopus 
Language:
en 
Publisher:
IEEE 
TUM Institution:
Hybride Elektronische Systeme